ISL 2008 - 2nd International Symposium on Laser-Micromachining at 3D-Micromac AG in Chemnitz

Date: 12th - 13th Nov. 2008


In the last years laser technologies not only confirmed their outstanding role for micro-machining but expanded it impressively. With enhancements in the areas of shorter pulses and shorter wavelengths there are growing possibilities to generate micro structures in all manufacturing sectors. 

Applications related to practice and latest trends will be presented by laser manufacturers and users utilizing laser micromachining in industry applications at „ISL 2008 - 2nd International Symposium on Laser-Micromachining“ on the 12th and 13th of November 2008 in Chemnitz, Germany.  

State of the art technology, latest developments, and perspectives will be shown on the basis of examples from industry and innovative R&D results. As already held at the first ISL in 2006 an intense dialogue between users from industry, developers, research, and science shall be conducted. 

3D-Micromac will be pleased to meet you in Chemnitz. We want to give you a platform for information exchange and at the same time deliver an insight into latest news and solutions – individual and user-oriented.

Program

Wednesday, November 12, 2008
 
12:00 – 12:15
Opening
Tino Petsch,
3D-Micromac AG
12:15 – 13:00 Excimer laser for deposition/transfer of thin films and structuring: Applications for fuel cells and OLEDs
PD Dr. Thomas K. Lippert
Paul Scherrer Institut
 
Session 1
Laser Application for Photovoltaic Processing
Session 2
Laser Applications

13:00 – 13:30 Laser processes for photovoltaics


Dr. Aart Schoonderbeek,
Laser Zentrum Hannover (LZH)
Laser micromachining business potential in China and Hong Kong
William Yim,
Hong Kong Electronics & Technologies Association
13:30 – 14:00 Laser technology for high efficiency solar cell fabrication
Sonja Hermann,
Institut für Solarenergieforschung Hameln/Emmerthal
Microstructures: a step towards smart interfaces
Jörg Stahlmann,
PTU Darmstadt
14:00 – 14.30 Laser micro-processing in solar cell production


Michael Haase,
Rofin/BAASEL Lasertechnik GmbH & Co. KG
Preparation of superhard ta-C films with low internal stress by means of Excimer laser ablation and irradiation
Prof. Dr. Steffen Weißmantel,
Laserinstitut Mittelsachsen e.V.
14:30 – 15:00 Laser chemical processing (LCP) for novel micro structuring applications
Dr. Daniel Kray,
Fraunhofer-Institut für Solare Energiesysteme ISE
Applications of lasers in ophthalmics

Dr. Conrad Höfener,
Rupp+Hubrach Optik GmbH

15:00 – 15:30

Coffee break 

15:30 – 16:00 Large scale laser structuring of aSi thin film solar cells
Sebastian Lipfert,
Signet Solar GmbH
Industrial applications with fiberlaser

Tim Westphäling,
IPG Laser GmbH
16:00 – 16:30 Depth selective laser scribing for thin film silicon solar cells


Dr. Wim Soppe,
Energy research Centre of the Netherlands
Possibilities of ultra fast pico- and femtosecond laser systems in roll-to-roll manufacturing processes for the Printed Intelligence
Dr. Jukka Hast,
VTT Finnland
16:30 – 17:00 Application of ultrafast lasers for selective structuring of CIS thin-film solar cells
Dr. Heinz Huber,
High Q Laser Production GmbH
The fabrication of high-quality microoptical elements in fused silica by laser etching
Rico Böhme, Roth & Rau AG, IOM Leipzig
Dr. Klaus Zimmer, IOM Leipzig

18:00
 
Evening program



Thursday, November 13, 2008
 
09:00 – 09:05
Opening
Tino Petsch,
3D-Micromac AG
09:05 – 09:30
From micro system to smart systems integration
Prof. Dr. Thomas Geßner,
Fraunhofer ENAS
 
Session 3
Laser Applications for MEMS Processing

Session 4
Laser Applications

09:30 – 10:00 Microsystems fabrication using laser technologies

Maik Wiemer,
Fraunhofer ENAS
Hybrid machine tool based on the combination of laser ablation and electrical discharge machining (EDM)
Patricia Weber,
wbk, Institute of Production Science, Universität Karlsruhe (TH)
10:00 – 10:30 Selective laser ablation of dielectric materials for MEMS devices
Dr. Sandra Zoppel,
Forschungszentrum Mikrotechnik – Fachhochschule Vorarlberg GmbH
Pulsed laser deposition

Heiner Eckermann,
Coherent Deutschland GmbH

10:30 – 11:00

Coffee break

 
 
Session 5
Laser

Session 6
Laser Applications

11:00 – 11:30 Choose the right laser technology for your specific micro machining application
Stefan Geiger, Rofin/BAASEL Lasertechnik GmbH & Co. KG
Laser material processing and length scale integration
Dr. Petko Petkov,
Cardiff University/MEC
11:30 – 12:00 Industrial picosecond lasers for micromachining, update on lasers, applications and potential
Bernhard Klimt,
Lumera Laser GmbH
Laser micromachining in high volume inkjet print head manufacturing

Dr. Jürgen Brühnahl,
Xaar Jet Ltd.
12:00 – 12:30 High resolution micromachining using pulsed UV Laser
Rainer Paetzel,
Coherent Deutschland GmbH
Microstructuring of various materials using fluorine and femtosecond laser pulses
Prof. Dr. Steffen Weißmantel,
Laserinstitut Mittelsachsen e.V
12:30 – 13:00 A comparison of pico second lasers and nano second lasers for the micro material processing
Otto Glatz,
Newport Spectra-Physics GmbH
Novel 3D-microcavity arrays for screening in biomedical and chemical industry: challenges of rapid laser processing technology
Prof. Dr. Andrea Robitzki,
Universität Leipzig
Biotechnologisch-Biomedizinisches Zentrum

13:00 – 14:00

Lunch break
 
14:00 – 14:30 Diode pumped and fibre based femtosecond lasers for micromachining applications
Marc Drechsler, Laser 2000 GmbH
Eric Mottay, Amplitude Systems
Stereolithography - a scalable process down to nm-resolution
Dr. Andreas Ostendorf,
Dr. Sven Passinger
Laser Zentrum Hannover e.V.
14:30 – 15:00 Machining with ultrashort pulsed lasers 
Dr. Thomas Höche,
3D-Micromac AG
Rapid microtooling with laser based methods
Robby Ebert,
Laserinstitut Mittelsachsen e.V
15:00 – 15:30 Material removal with highly repetitive fs laser pulses
Jörg Schille,
Laserinstitut Mittelsachsen e.V
Exotic polarisations and other new developments in micromachining
Prof. Dr. Gerd Marowsky,
Laser-Laboratorium Göttingen GmbH
15:30 – 16:00 Accuracy meets dynamics 

Jochen Jäger,
Aerotech GmbH
Diagnostics of picosecond non-linear laser-ablation phenomena
Dr. Nadja I. Vogel,
TU Chemnitz - Institut für Physik

Conference hotel
Hotel „Chemnitzer Hof“
Theaterplatz 4
09111 Chemnitz, Germany
Phone:  +49 (0)371 684-0
http://www.guennewig.de 

Participation fee
The participation fee includes: 
- Participation at symposium
- Lunch and coffee breaks
- Evening program 

Registration after 31 May 08
- Participants                350 €
- Students                    150 € 

The participation fee becomes due receipt of invoice.

Cancellations of participation will only accepted in written form. In case of cancellation until 31 May 2008 a handling charge in amount of 150 € will be charged. For cancellations after the 31 May 2008 the full participation fee will be charged. 

Registration
Please send the signed registration form via fax to:+49 (0)371 40043 40

Upon receipt of your registration you will receive a confirmation as well as an invoice.  
Hotel reservation
A certain contingent of hotel rooms with special negotiated prices has been reserved for the participants of ISL 2008. We strongly suggest making your reservations as soon as possible. 

Single room:                  79 €
Double room:                 99 € 

For hotel booking please use the key word:  „3D-Micromac AG“

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