SID 2010 Seattle, USA - 25.05.2010

From May 25, 2010 to May 27, 2010 the SID 2010 will take place in Washington State Convention Center, Seattle, WA, USA.

3D-Micromac AG will be present at the booth of germany, no. 520. The company will exhibit their new innovative and powerful systems for micro machining within the LED/OLED- and display manufacturing.

More: http://www.sid.org/conf/sid2010/sid2010.html

LOPE-C 2010, Frankfurt a.M. - 31.05.2010

EPMT 2010, Lausanne, Switzerland - 08.06.2010

More: http://www.epmt.ch/index.htm

Lasys 2010 Stuttgart - 08.06.2010

From June 8, 2010 to June 10, 2010 3D-Micromac AG will show their new high performance laser systems for micro machining at the Lasys 2010 in Stuttgart, hall 1, booth 1 F24

More: http://www.lasys-messe.de

25 EUPVSEC 2010, Valencia, Spain - 06.09.2010

From September 6, 2010 to Spetember 10, 2010 the 25th European Photovoltaic Solar Energy Conference and Exhibition will take place at Feria Valencia in Valencia, Spain.

3D-Micromac AG will be present in hall 4, level 2, booth L2/H4/A9, to show their new innovative and powerful systems for laser micro machining, developed for the photovoltaic industry.

More: http://www.photovoltaic-conference.com/

LOPE-C Large-area Organic & Printed Electronics Convention - 31.05.2010

E-MRS Spring Meeting 2010, Strasbourg, Frankreich - 07.06.2010

Speech: Laser scribing of TCO and organic solar cells

Abstract: In the last years more and more effort has been put into the development of thin-film organic solar cells using conductive and semi-conductive polymers. A great advantage of these polymers is the possibility to deposit them in high throughput print and coating processes. This feature provides huge potential for future production of low cost photovoltaics. While polymers form the active layer, ITO is used as transparent front contact. Both materials have to be patterned in order to make the solar cell work. That patterning can be done by either a structured printing step or, as already established in silicon based photovoltaics, by high precision laser scribes (P1/P2/P3). For those scribes 1064nm, 532nm and 355nm are established wavelengths in the area of laser micromachining. 3D-Micromac used ultra-short pulsed lasers to evaluate the applicability of those wavelengths for a selective ablation of an indium tin oxide (ITO) layer on glass and polyethylene (PET) foil as well as a bulk hetero junction consisting of a poly(3-hexylthiophene):phenyl-C61-butyric acid methyl ester (P3HT:PCBM) on top of a Poly(3,4-ethylenedioxythiophene) poly(styrenesulfonate) (PEDOT:PSS) and ITO film system on glass substrates. The results of the research so far will be presented as well as 3D-Micromac’s R2R tool “microSPIN”, which is used for the development of continuous R2R processes.

 

Further Information: http://www.strasbourgmeeting.com/

5th Dornbirner Mikrotechniktage - 08.06.2010

Spie Optics + Photonics Conference, San Diego - 01.08.2010

Speech: Laser Scribing of ITO and Organic Solar Cells

Location: San Diego Convention Center, San Diego, California, USA

Abstract: The development of thin-film organic solar cells using conductive and semi-conductive polymers has seen great progress in the past years. While different polymers form the active layer, ITO is used as transparent front contact. Both materials have to be patterned in order to make the solar cell work. That patterning can be done by high precision laser scribes (P1/P2/P3) using ultra-short pulse lasers for selective ablation. The results of the research so far will be presented as well as 3D-Micromac’s R2R tool “microSPIN”, which is used for the development of continuous R2R processes.

More Information: http://spie.org/optics-photonics.xml

IS&T’s Digital Fabrication 2010 - 19.09.2010

Jens Haenel, CTO of 3D-Micromac will give the presentation "Laser Scribing of ITO and Organic Solar Cells,” at IS&T’s Digital Fabrication 2010 (DF 10) to be held September 19-23, 2010 in Austin, TX. The paper will be presented during the Printed Electronics: Processes session on 9/20/2010.

More: http://www.imaging.org/ist/conferences/df/index.cfm