ISL 2008 - 2nd International Symposium on Laser-Micromachining at 3D-Micromac AG in Chemnitz

Date: 12th - 13th Nov. 2008

In the last years laser technologies not only confirmed their outstanding role for micro-machining but expanded it impressively. With enhancements in the areas of shorter pulses and shorter wavelengths there are growing possibilities to generate micro structures in all manufacturing sectors. 

Applications related to practice and latest trends will be presented by laser manufacturers and users utilizing laser micromachining in industry applications at „ISL 2008 - 2nd International Symposium on Laser-Micromachining“ on the 12th and 13th of November 2008 in Chemnitz, Germany.  

State of the art technology, latest developments, and perspectives will be shown on the basis of examples from industry and innovative R&D results. As already held at the first ISL in 2006 an intense dialogue between users from industry, developers, research, and science shall be conducted. 

3D-Micromac will be pleased to meet you in Chemnitz. We want to give you a platform for information exchange and at the same time deliver an insight into latest news and solutions – individual and user-oriented.

Program

Wednesday, November 12, 2008
12:00 – 12:15	Opening Tino Petsch, 3D-Micromac AG
12:15 – 13:00	Excimer laser for deposition/transfer of thin films and structuring: Applications for fuel cells and OLEDs PD Dr. Thomas K. Lippert Paul Scherrer Institut
	Session 1 Laser Application for Photovoltaic Processing	Session 2 Laser Applications
13:00 – 13:30	Laser processes for photovoltaics Dr. Aart Schoonderbeek, Laser Zentrum Hannover (LZH)	Laser micromachining business potential in China and Hong Kong William Yim, Hong Kong Electronics & Technologies Association
13:30 – 14:00	Laser technology for high efficiency solar cell fabrication Sonja Hermann, Institut für Solarenergieforschung Hameln/Emmerthal	Microstructures: a step towards smart interfaces Jörg Stahlmann, PTU Darmstadt
14:00 – 14.30	Laser micro-processing in solar cell production Michael Haase, Rofin/BAASEL Lasertechnik GmbH & Co. KG	Preparation of superhard ta-C films with low internal stress by means of Excimer laser ablation and irradiation Prof. Dr. Steffen Weißmantel, Laserinstitut Mittelsachsen e.V.
14:30 – 15:00	Laser chemical processing (LCP) for novel micro structuring applications Dr. Daniel Kray, Fraunhofer-Institut für Solare Energiesysteme ISE	Applications of lasers in ophthalmics Dr. Conrad Höfener, Rupp+Hubrach Optik GmbH
15:00 – 15:30	Coffee break
15:30 – 16:00	Large scale laser structuring of aSi thin film solar cells Sebastian Lipfert, Signet Solar GmbH	Industrial applications with fiberlaser Tim Westphäling, IPG Laser GmbH
16:00 – 16:30	Depth selective laser scribing for thin film silicon solar cells Dr. Wim Soppe, Energy research Centre of the Netherlands	Possibilities of ultra fast pico- and femtosecond laser systems in roll-to-roll manufacturing processes for the Printed Intelligence Dr. Jukka Hast, VTT Finnland
16:30 – 17:00	Application of ultrafast lasers for selective structuring of CIS thin-film solar cells Dr. Heinz Huber, High Q Laser Production GmbH	The fabrication of high-quality microoptical elements in fused silica by laser etching Rico Böhme, Roth & Rau AG, IOM Leipzig Dr. Klaus Zimmer, IOM Leipzig
18:00	Evening program

Thursday, November 13, 2008
09:00 – 09:05	Opening Tino Petsch, 3D-Micromac AG
09:05 – 09:30	From micro system to smart systems integration Prof. Dr. Thomas Geßner, Fraunhofer ENAS
	Session 3 Laser Applications for MEMS Processing	Session 4 Laser Applications
09:30 – 10:00	Microsystems fabrication using laser technologies Maik Wiemer, Fraunhofer ENAS	Hybrid machine tool based on the combination of laser ablation and electrical discharge machining (EDM) Patricia Weber, wbk, Institute of Production Science, Universität Karlsruhe (TH)
10:00 – 10:30	Selective laser ablation of dielectric materials for MEMS devices Dr. Sandra Zoppel, Forschungszentrum Mikrotechnik – Fachhochschule Vorarlberg GmbH	Pulsed laser deposition Heiner Eckermann, Coherent Deutschland GmbH
10:30 – 11:00	Coffee break
	Session 5 Laser	Session 6 Laser Applications
11:00 – 11:30	Choose the right laser technology for your specific micro machining application Stefan Geiger, Rofin/BAASEL Lasertechnik GmbH & Co. KG	Laser material processing and length scale integration Dr. Petko Petkov, Cardiff University/MEC
11:30 – 12:00	Industrial picosecond lasers for micromachining, update on lasers, applications and potential Bernhard Klimt, Lumera Laser GmbH	Laser micromachining in high volume inkjet print head manufacturing Dr. Jürgen Brühnahl, Xaar Jet Ltd.
12:00 – 12:30	High resolution micromachining using pulsed UV Laser Rainer Paetzel, Coherent Deutschland GmbH	Microstructuring of various materials using fluorine and femtosecond laser pulses Prof. Dr. Steffen Weißmantel, Laserinstitut Mittelsachsen e.V
12:30 – 13:00	A comparison of pico second lasers and nano second lasers for the micro material processing Otto Glatz, Newport Spectra-Physics GmbH	Novel 3D-microcavity arrays for screening in biomedical and chemical industry: challenges of rapid laser processing technology Prof. Dr. Andrea Robitzki, Universität Leipzig Biotechnologisch-Biomedizinisches Zentrum
13:00 – 14:00	Lunch break
14:00 – 14:30	Diode pumped and fibre based femtosecond lasers for micromachining applications Marc Drechsler, Laser 2000 GmbH Eric Mottay, Amplitude Systems	Stereolithography - a scalable process down to nm-resolution Dr. Andreas Ostendorf, Dr. Sven Passinger Laser Zentrum Hannover e.V.
14:30 – 15:00	Machining with ultrashort pulsed lasers  Dr. Thomas Höche, 3D-Micromac AG	Rapid microtooling with laser based methods Robby Ebert, Laserinstitut Mittelsachsen e.V
15:00 – 15:30	Material removal with highly repetitive fs laser pulses Jörg Schille, Laserinstitut Mittelsachsen e.V	Exotic polarisations and other new developments in micromachining Prof. Dr. Gerd Marowsky, Laser-Laboratorium Göttingen GmbH
15:30 – 16:00	Accuracy meets dynamics  Jochen Jäger, Aerotech GmbH	Diagnostics of picosecond non-linear laser-ablation phenomena Dr. Nadja I. Vogel, TU Chemnitz - Institut für Physik

Conference hotel
Hotel „Chemnitzer Hof“
Theaterplatz 4
09111 Chemnitz, Germany
Phone:  +49 (0)371 684-0
http://www.guennewig.de 

Participation fee
The participation fee includes: 
- Participation at symposium
- Lunch and coffee breaks
- Evening program 

Registration after 31 May 08
- Participants                350 €
- Students                    150 € 

The participation fee becomes due receipt of invoice.

Cancellations of participation will only accepted in written form. In case of cancellation until 31 May 2008 a handling charge in amount of 150 € will be charged. For cancellations after the 31 May 2008 the full participation fee will be charged. 

Registration
Please send the signed registration form via fax to:+49 (0)371 40043 40

Upon receipt of your registration you will receive a confirmation as well as an invoice.  

Hotel reservation
A certain contingent of hotel rooms with special negotiated prices has been reserved for the participants of ISL 2008. We strongly suggest making your reservations as soon as possible. 

Single room:                  79 €
Double room:                 99 € 

For hotel booking please use the key word:  „3D-Micromac AG“