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Technology: 
Thin-Film Deposition in UHV
Thin-Film Deposition in UHV
Applications:
Laser-MBE of Premium Thin Films
Materials:
Metals, Complex Oxides, Nitrides, Carbides
Load Lock and UHV Chamber:
Laser MBE of premium thin films benefits from deposition in an ultra-high vacuum. In order to attain shortest possible pump cycles, three targets and the substrate are mounted in dedicated carriers. From a load lock, the latter can be easily transferred into a UHV chamber made of non-magnetic steel using a universal transfer rod equipped with a bayonet head.
Thin-Film Synthesis:
Starting from a base pressure in the 10-10 mbar range, residual-gas composition can be monitored using a mass spectrometer. When combined with a mass-flow controller, a well-defined background-gas pressure (N2, Ar etc.) can be maintained. A computer-controller target manipulator carousel featuring three indexable positions for 1“ targets is facing a 1 x 1 cm2 substrate. The substrate can be heated up to 1100°C, eucentrically tilted, and possesses motorized rotation within an insulating retainer. Synchronised two-axes rotation ensures even ablation of the targets.
Options:
The progress of thin-film synthesis can be tracked by RHEED as well as spectral ellipsometry. A solenoid coil for articulate-free deposition, ion-beam sources for ion-beam assisted thin-film synthesis, scanner optics for in situ patterning, as well as a mask between target and substrate (for combinatorial PLD) can be optionally implemented. When combinated with a micromachining workstation for individual mask preparation, or ex situ structuring of eposited films, your microPLD station becomes a universal and extremely versatile research instrument.